Dresden 2011 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 42: Poster I: Progress in Micro- and Nanopatterning: Techniques and Applications (jointly with O); Spins in Organic Materials; Ion Interactions with Nano Scale Materials; Organic Electronics and Photovoltaics; Plasmonics and Nanophotonics (jointly with HL and O); High-k and Low-k Dielectrics (jointly with DF); Organic Thin Films; Nanoengineered Thin Films; Layer Deposition Processes; Layer Properties: Electrical, Optical, and Mechanical Properties; Thin Film Characterisation: Structure Analysis and Composition; Application of Thin Films

DS 42.64: Poster

Mittwoch, 16. März 2011, 15:00–17:30, P1

Customized arrangements of a-Ge nanocolumns by glancing angle deposition — •Jens Bauer, Michael Weise, Chinmay Khare, Christoph Grüner, and Bernd Rauschenbach — Leibniz-Institut für Oberflächenmodifizierung, Permoserstrasse 15, D-04318 Leipzig, Germany

We present PVD investigations on self-organized a-Ge nanostructures by glancing angle deposition (GLAD). In particular, a Ge particle beam provided by ion-beam sputtering is directed under a flat angle to the substrate (glancing angle < 5^∘). As a result of shadowing inclined nanoneedles evolve competitively. By use of substrate rotation the nanostructure can be customized to vertical posts, screws or spirals. To improve nanostructure arrangement and uniformity patterned substrates with symmetrically ordered surface mounds were applied: square and hcp orders by electron beam lithography and honeycomb or hcp orders by nanosphere lithography. The temporal evolution is distinguished by three morphological stages: 1) Initially the shape and size of the pre-pattern mounds determine the GLAD structures’ shape. The structure thickness successively broadens. 2) Following a columnar shape with parallel border planes is obtained reflecting the pattern symmetry: square cross-section for square order, three-fold for honeycomb, and hexagonal to round for hcp. Characteristic caps are formed at the nanostructures’ tops. Both the size of the border planes and the cap size depend strongly on the glancing angle and the pattern periodicity. 3) Caused by increasing competition the formation of individual GLAD columns stops and the pre-pattern arrangement gets lost.