Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 42: Poster I: Progress in Micro- and Nanopatterning: Techniques and Applications (jointly with O); Spins in Organic Materials; Ion Interactions with Nano Scale Materials; Organic Electronics and Photovoltaics; Plasmonics and Nanophotonics (jointly with HL and O); High-k and Low-k Dielectrics (jointly with DF); Organic Thin Films; Nanoengineered Thin Films; Layer Deposition Processes; Layer Properties: Electrical, Optical, and Mechanical Properties; Thin Film Characterisation: Structure Analysis and Composition; Application of Thin Films

DS 42.68: Poster

Mittwoch, 16. März 2011, 15:00–17:30, P1

Design and construction of an apparatus for the deposition of mass selected metal clusters — •Arne Fischer, Herbert Gleiter, and Horst Hahn — Karlsruher Institut für Technologie, Institut für Nanotechnologie, 76344 Eggenstein-Leopoldshafen, Germany

We report on the design and the construction of an apparatus for the non-destructive deposition of mass selected metal clusters. It will give us the opportunity to study clusters on various surfaces as well as clusters buried in matrices of other materials.

The clusters are provided by a magnetron sputter source installed in a liquid nitrogen cooled tube. The cold surrounding allows the sputtered atoms to condense to clusters, which are extracted by a helium stream. Depending on the mode of operation either anions or cations are accelerated and formed to an ion beam by electrostatic lenses. Downstream the beam gets mass separated in a 90° sector magnet (r = 500mm, resolution approx. 1/50), decelerated by an array of two einzellenses and finally soft landed on a cooled substrate (landing energy approx. 0.1 eV/atom). The matrix material can be optionally co-deposited via an integrated MBE.