Dresden 2011 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 42: Poster I: Progress in Micro- and Nanopatterning: Techniques and Applications (jointly with O); Spins in Organic Materials; Ion Interactions with Nano Scale Materials; Organic Electronics and Photovoltaics; Plasmonics and Nanophotonics (jointly with HL and O); High-k and Low-k Dielectrics (jointly with DF); Organic Thin Films; Nanoengineered Thin Films; Layer Deposition Processes; Layer Properties: Electrical, Optical, and Mechanical Properties; Thin Film Characterisation: Structure Analysis and Composition; Application of Thin Films
DS 42.91: Poster
Mittwoch, 16. März 2011, 15:00–17:30, P1
H2 plasma modification of polydimethylsiloxane thin films investigated by infrared reflection absorption spectroscopy — •Vladimir Danilov, Hans-Erich Wagner, and Jürgen Meichsner — Ernst Moritz Arndt University of Greifswald, Germany
Plasma modification of polydimethylsiloxane (PDMS) thin films was studied by means of Fourier-Transform-Infrared-Reflection-Absorption-Spectroscopy. The spin-coated PDMS films with the thickness between 10 nm and 400 nm were prepared on Al-coated glass substrates and were treated by direct contact with H2 plasma as well as by the H2 plasma radiation, only. In direct plasma treatment the substrates were positioned on the powered electrode of an asymmetric capacitively coupled RF discharge in H2 at low pressure. The influence of the plasma radiation was studied in different spectral ranges due to the screening of the thin film from the bulk plasma by selected window characterized by different cut-off wavelength: soda-lime glass (300 nm), quartz glass (160 nm) and MgF2 (115 nm). The strong modification effect was observed in experiments with the MgF2 window, only. The evolution of IR spectra was monitored, and the changes of PDMS characteristic absorption bands as well as the formation of new bands are discussed. It was found that the films consist of methyl-free SiOx top layer (10-30 nm), followed by partially methyl-free region, and an underlying non-modified PDMS layer in the case of thin films prepared with initial thickness exceeding 350-400 nm.
Funded by the Volkswagen Foundation, Plasma Hybrid Coating, grant no. I/83275.