Dresden 2011 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 42: Poster I: Progress in Micro- and Nanopatterning: Techniques and Applications (jointly with O); Spins in Organic Materials; Ion Interactions with Nano Scale Materials; Organic Electronics and Photovoltaics; Plasmonics and Nanophotonics (jointly with HL and O); High-k and Low-k Dielectrics (jointly with DF); Organic Thin Films; Nanoengineered Thin Films; Layer Deposition Processes; Layer Properties: Electrical, Optical, and Mechanical Properties; Thin Film Characterisation: Structure Analysis and Composition; Application of Thin Films

DS 42.96: Poster

Mittwoch, 16. März 2011, 15:00–17:30, P1

In-Situ SEM Investigation Of Swift Heavy Ion Induced Dewetting — •Daniel Garmatter, Michael Haag, Redi Ferhati, Sankarakumar Amirthapandian, and Wolfgang Bolse — Institut für Halbleiteroptik und Funktionelle Grenzflächen, Universität Stuttgart

Recently we have found that swift heavy ion (SHI) irradiation of thin oxide films on Si results in restructuring [1] similar to the dewetting patterns formed when melting polymer films on Si [2]. However, in these ex-situ experiments we could only investigate the average development of the surface structure, since a new sample had to be taken for each irradiation fluence. With our new in-situ SEM/EDX at the UNILAC accelerator of GSI [3] we are now able to follow the history of individual objects from the first ion impact until their final state. The nucleation and growth mechanisms of SHI induced dewetting can now be easily studied, since the irradiation process can be controlled in very small fluence steps and dewetting stops as soon as the ion beam is switched off. This allows to immediately freeze the actual state of dewetting for careful analysis, which is hardly possible in case of liquid films. After the next irradiation step, one and the same spot can be analyzed again and such the nucleation and growth kinetics of individual dewetting holes can be determined. We will report our first results on SHI induced dewetting of iron-oxide layers with varying film thicknesses and artificial defect concentrations. [1] T. Bolse, et al., Nucl.Instr.Meth. 245 (2006), [2] S. Herminghaus, et al., Science 282 (1998), [3] S. Amirthapandian, et al., Rev.Sci.Instr. 81, (2010)