Dresden 2011 – scientific programme

Parts | Days | Selection | Search | Updates | Downloads | Help

DS: Fachverband Dünne Schichten

DS 47: Ion Interactions with Nano Scale Materials II (Focused Session -- Organisers: Diesing, Facsko)

DS 47.2: Topical Talk

Thursday, March 17, 2011, 15:15–15:45, GER 37

The impact of fast ions in pulsed laser deposition — •Michael Schmid — TU Wien, Institut für Angewandte Physik, Wien, Austria

Pulsed laser deposition (PLD) is a method for growing thin films that combines nonthermal particle energies (typically 30 to 300 eV) with ultrahigh-vacuum compatibility. This allows us to study the effects of energetic ions on growth of ultrathin films by high-resolution scanning tunneling microscopy [1]. Ions with energies above 100 eV can create adatoms or small adatom clusters by “failed sputtering”, which increases the number of nucleation centers and, thus, the island density. Ion implantation in the surface is possible already at lower energies. In heteroepitaxy, ion implantation creates a chemically inhomogeneous surface, which modifies surface diffusion and again leads to an increased island density. High island densities, combined with facile implantation near steps, result in improved layer-by-layer growth. We propose that the same mechanisms are effective in sputter deposition.

[1] M. Schmid et al., Phys. Rev. Lett. 103, 076101 (2009).