Dresden 2011 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 48: Ion Interactions with Nano Scale Materials III (Focused Session -- Organisers: Diesing, Facsko)

DS 48.5: Vortrag

Donnerstag, 17. März 2011, 17:15–17:30, GER 37

Nanohole Pattern Formation on Ge by Focused Ion Beam and Broad Beam — •Monika Fritzsche, Stefan Facsko, and Kilian Lenz — Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, P.O. Box 510119, 01314 Dresden, Germany

The morphology of surfaces strongly influences optical, electrical, and magnetic properties of thin films. Using low energy ion beam sputtering different self-organized periodic patterns can be obtained. These are ripple patterns with periodicities in the nanometre range for oblique ion incidence and hexagonal dot patterns on compound materials for normal incidence. Low energy ion beam sputtering of Ge at normal incidence using a 5 keV Ga⁺ focused ion beam (FIB) produces periodic nanohole patterns [1]. In this work we studied the flux dependence of nanohole formation using FIB technique and compared the results with patterns produced by broad Ga⁺ beam sputtering with a six orders of magnitude smaller ion flux. In both cases Ga⁺ ions with an energy of 5 keV at normal incidence were used. Obtaining the same results shows that nanohole formation is independent of flux over a few orders of magnitude and that rastering of the FIB does not add extra contributions.
Q. Wei, X. Zhou, B. Joshi, Y. Chen, K. Li, Q. Wei, K. Sun, and L. Wang, Adv. Mater. 21, 2865 (2009).