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DS: Fachverband Dünne Schichten

DS 54: Nanoengineered Thin Films

DS 54.3: Vortrag

Donnerstag, 17. März 2011, 18:30–18:45, GER 38

Novel Plasma Process for the Deposition of Nanocomposites for Plasmonic Applications — •Ralph Schmittgens¹, Marcus Wolf¹, Peter Frach², and Gerald Gerlach¹ — ¹Technische Universität Dresden, Dresden, Deutschland — ²Fraunhofer Institut für Elektronenstrahl- und Plasmatechnik, Dresden, Deutschland

There is a growing interest in the application of plasmonic effects in metal nanostructures, e.g. surface plasmon resonances in metallic nanocrystals embedded in a dielectric matrix. Applications like photovoltaics, optics or sensors require a process to produce these structures efficiently on large area substrates using low-temperature processes. At TU Dresden a hybrid vacuum deposition process was developed,where nanoparticles are generated in a gas phase condensation and subsequently embedded in a plasma deposited thin film. The process operates at room temperature and is up-scalable. In this contribution, results on the deposition of Ag nanoparticles in a dielectric matrix are presented. The films exhibit plasmonic absorption/scattering due to the Ag nanoparticle's surface plasmon resonances. The fill factor of the Ag nanoparticles can be easily adjusted so that nanocomposites below and above the percolation threshold can be deposited. This performance is demonstrated by optical absorption and capacitance/resistance measurements.