Dresden 2011 –
wissenschaftliches Programm
DS 7: Layer Properties: Electrical, Optical and Mechanical Properties
Montag, 14. März 2011, 17:45–19:30, GER 37
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17:45 |
DS 7.1 |
Ink-jet printing of silver tracks on porous surfaces and improvement of conductivity — •Anna Schuppert, Joachim Wollschläger, Lorentz Walder, and Wolfgang Schmidt
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18:00 |
DS 7.2 |
Statistical Analysis of Computer-simulated On-Chip Interconnect Electromigration Lifetimes under the Influence of Microstructure and Strengthened Top Interface — •Matthias Kraatz, Lijuan Zhang, Dieter Schmeisser, Ehrenfried Zschech, and Paul S. Ho
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18:15 |
DS 7.3 |
Entwicklung eines Messverfahrens zur Bestimmung der elektrostriktiven Konstante von dünnen Polymerschichten — •Christian Schirrmann, Kirstin Bornhorst und Florenta Costache
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18:30 |
DS 7.4 |
Charging of internal interfaces in metal-insulator-metal heterosystems by low energy electron beams — •Johannes Hopster, Marika Schleberger, Andreas Wucher, and Detlef Diesing
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18:45 |
DS 7.5 |
Mapping of internal photoemission in metal–insulator–metal heterosystems — Dominik Differt, Walter Pfeiffer, and •Detlef Diesing
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19:00 |
DS 7.6 |
Determination of the electrically active Al fraction in Al doped ZnO grown by pulsed reactive magnetron sputtering — •Steffen Cornelius, Mykola Vinnichenko, Frans Munnik, René Heller, Andreas Kolitsch, and Wolfhard Möller
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19:15 |
DS 7.7 |
Ellipsometric study of copper growth on silicon — •Francisc Haidu, Ovidiu D. Gordan, and Dietrich R. T. Zahn
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