Dresden 2011 – scientific programme

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DS: Fachverband Dünne Schichten

DS 9: Thin Film Characterisation: Structure Analysis and Composition (XRD, TEM, XPS, SIMS, RBS, ...) II

DS 9.4: Talk

Monday, March 14, 2011, 12:45–13:00, GER 38

Electron microscopy study of amorphous SiCN hard coatings — •Andrea Sendzik, Steffen Schulze, Marcus Günther, Frank Richter, and Michael Hietschold — Institut für Physik, Technische Universität Chemnitz, 09107 Chemnitz

The two-component systems Si-C, Si-N and C-N have been studied in terms of their mechanical, electrical and optical properties. The goal for the ternary amorphous SiCN compounds is to unite the positive properties of the binaries, such as chemical stability, hardness and large band gap. We have characterized thine layers by scanning electron microscopy (SEM) and transmission electron microscopy (TEM), through the studies of diffraction patterns and the analysis of electron energy loss spectra (EELS).The layers were produced by plasma enhanced chemical vapor deposition PECVD. For this a mixture of following gases was used: Ttrimethylsilane (SiH(CH₃)₃), N₂ and Ar. A series of samples has been prepared, differing in terms of gas composition and pressure. All SiCN films were deposited on silicon or on NaCl(100) substrates. By SEM the morphology of the layers were characterized. The atomic structure was investigated by TEM. By analyzing diffraction patterns and EELS-spectra findings about the short-range order of atoms, the atomic composition, and the chemical bonding were made. By comparing the experimentally obtained scattering curves with model distributions earlier structural ideas could be expanded and systematized in accordance with the deposition conditions. In addition the first results of mechanical tests are presented, such as E-Modul and stress values of the layer.