Dresden 2011 – scientific programme

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DY: Fachverband Dynamik und Statistische Physik

DY 34: Fluid Dynamics and Turbulence II

DY 34.4: Talk

Thursday, March 17, 2011, 15:00–15:15, ZEU 255

Dynamical model for the formation of patterned deposits at receding contact lines — •Uwe Thiele, Lubor Frastia, and Andrew J. Archer — Department of Mathematical Sciences, Loughborough University, Loughborough, Leicestershire, LE11 3TU, UK

We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes [1]. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organised pinning-depinning cycles corresponding to a stick-slip motion of the contact line [2]. We analyze how the line pattern properties depend on the evaporation rate and solute concentration.

[1] R. D. Deegan et.al, Nature 389, 827 (1997); G. Berteloot et. al, Phys. Rev. E (2010), submitted; H. Yabu and M. Shimomura, Adv. Funct. Mater. 15, 575 (2005); J. Xu et al., Phys. Rev. Lett. 96, 066104 (2006); S. W. Hong, J. F. Xia, and Z.Q. Lin, Adv. Mater. 19, 1413 (2007); H. Bodiguel, F. Doumenc, and B. Guerrier, Langmuir 26, 10758 (2010).

[2] L. Frastia, A. J. Archer and U. Thiele, submitted (2010), at arxiv: http://arxiv.org/abs/1008.4334v1