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HL: Fachverband Halbleiterphysik

HL 44: Poster Session I

HL 44.95: Poster

Dienstag, 15. März 2011, 18:00–21:00, P3

Copper oxide films prepared by rf sputter deposition — •Ekachai Chongsereecharoen, Achim Kronenberger, Angelika Polity, and Bruno K. Meyer — I. Physikalisches Institut, Justus-Liebig-Universität Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany

Cuprite (Cu₂O) and tenorite (CuO) are two well known phases of copper oxide. A metastable copper oxide, paramelaconite (Cu₄O₃), is another phase of copper oxide which has been rarely studied. CuO is p-type semiconductor which has many application such as solar cells, sensors and lithium ion Batteries. In this study CuO and Cu₄O₃ films were prepared on glass substrates by reactive rf sputter deposition. The structural properties were characterized by x-ray diffraction. The results show that with varying deposition conditions (sputtering power and oxygen flow rate), the formation of CuO and Cu₄O₃ phase is controllable. The optical and electrical properties of the sputtered films were investigated by optical spectroscopy and Hall effect measurement respectively. The properties of the films depend on the phase of the prepared films and deposition conditions.