Dresden 2011 – scientific programme
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HL: Fachverband Halbleiterphysik
HL 55: Photovoltaics: mainly Technology and Photon Management
HL 55.6: Talk
Wednesday, March 16, 2011, 15:45–16:00, FOE Anorg
Comparative characterisation of sputtered ZnO:Al TCO-layers on float glass produced by large ceramic and metallic targets — •Sebastian Wohner1, Hartmut Witte1, Fahri Uslu2, Jörg Günther2, Jürgen Bläsing1, Martin Bähr2, and Alois Krost1 — 1Institut für Experimentelle Physik, Otto-von-Guericke-Universität Magdeburg — 2Euroglas GmbH, Haldensleben
One of the main parts of photovoltaic cells is the conductive and transparent front contact which is often realized by wide bandgap ZnO. D.C magnetron sputtering with ceramic ZnO:Al2O3 targets is one of the commonly used processes to produce ZnO-layers on float glass. Disadvantages are the fixed stoichiometric proportions and the high temperatures.
Alternatively, Al-doped ZnO-layers were deposited by reactive d.c. magnetron sputtering from a large, planar Zn(Al) under oxygen ambience. Hereby the operating point has to be within the unstable transition region of the power - oxygen pressure characteristic.
For comparison ZnO layers were produced by reactive and by ceramic magnetron d.c. sputtering using large targets. The ZnO layers were characterized and compared by resistivity, Hall-effect as well as by optical transmission- and reflection measurements to get the electron concentration using the Drude-model. The surface and the crystal structure were analysed by AFM and Bragg-Brentano X-ray diffraction, respectively. The results show the potential for the production of qualitatively good ZnO-layers as TCO by reactive d.c. magnetron sputtering on large cathodes using adapted process controlling.