Dresden 2011 – scientific programme

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KR: Fachgruppe Kristallographie

KR 5: Poster Multiferroics (Joint Session of MA, DF, DS, KR, TT)

KR 5.24: Poster

Tuesday, March 15, 2011, 10:45–13:00, P2

An experimental approach to a 2-dimensional random resistor network — •Miriam Lange, Philipp Szary, Oleg Petracic, and Hartmut Zabel — Institut für Experimentalphysik/Festkörperphysik, Ruhr-Universität Bochum, D-44780 Bochum, Germany

We present an experimental approach to a 2-dimensional random resistor network using the nanosphere lithography technique. Our samples are prepared by using self-organized polystyrene micro-particles of 500 nm diameter forming a 2-dimensional array of hexagonal order on top of a Si substrate. By means of oxygen plasma etching the diameter of the spheres is reduced in a controlled fashion. In a subsequent metallization step a Permalloy (Py = Ni₈₀Fe₂₀) layer with a thickness of 20 nm is deposited with the particle array acting as a shadow mask. After final lift-off the Py pattern remains as an antidot array, where each bridge represents a resistor in a 2-d network. The randomness of the preliminary particle self-organization process is transferred onto the network. Variation of the etching time allows us to fabricate systems of different connection widths. Magnetic and electrical properties have been studied by means of magnetic force microscopy (MFM), magneto-optical Kerr-effect (MOKE), superconducting interference device (SQUID) and magnetoresistance (MR) measurements.