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Dresden 2011 – wissenschaftliches Programm

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MA: Fachverband Magnetismus

MA 52: Magnetic Thin Films III

MA 52.5: Vortrag

Donnerstag, 17. März 2011, 12:00–12:15, HSZ 403

Anisotropic magnetorestistance and magnetic anisotropy of Heusler compound thin films — •Matthias Althammer1, Alexander T. Krupp1, Franz D. Czeschka1, Matthias Opel1, Inga-Mareen Imort2, Günter Reiss2, Andy Thomas2, Rudolf Gross1, and Sebastian T. B. Goennenwein11Walther-Meißner-Institut, Bayerische Akademie der Wissenschaften, Garching, Germany — 2Fakultät für Physik, Universität Bielefeld, Bielefeld, Germany

Magnetic anisotropy is of fundamental importance in ferromagnets, as it strongly influences their properties. Using anisotropic magnetoresistance (AMR) measurements, we investigate the magnetic anisotropy of the ferromagnetic Heusler compound Co2FeAl. Thin Co2FeAl films grown on (001)-oriented MgO substrate were patterned into Hall-bar mesa structures via optical lithography and etching. To quantify the magnetic anisotropy, we recorded the angle dependent magnetoresistance (ADMR), i.e., the AMR as a function of magnetic field orientation for different magnetic field magnitudes |H|. From the ADMR data taken at high |H|, the resistivity coefficients are obtained. The magnetic anisotropy is then extracted from ADMR taken at lower |H|. We will quantitatively compare the resistivity coefficients and the magnetic anisotropy in Co2FeAl thin films with thicknesses of 20 nm, 50 nm, 80 nm, 100 nm, as a function of temperature from 5 K to 350 K.

Financial support by the Deutsche Forschungsgemeinschaft via project GO 944/3-1 and the NRW MIWF is gratefully acknowledged.

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