Dresden 2011 – scientific programme

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MI: Fachverband Mikrosonden

MI 1: Tutorial on State of the Art of X-Ray Microanalysis

MI 1.4: Tutorium

Sunday, March 13, 2011, 18:30–19:15, HSZ 401

2D- and 3D-microanalysis using focussed MeV-ion beams — •Tilman Butz — Institute for Experimental Physics II, Universität Leipzig, 04103 Leipzig, Germany

This tutorial introduces the following ion beam techniques for analysis and material modification: Analysis: Rutherford Backscattering Spectrometry (RBS), mainly for thin film analysis; Particle Induced X-Ray Emission (PIXE), elemental maps, main and trace elements; Scanning Transmission Ion Microscopy (STIM), density contrast; STIM-tomography, 3D density; PIXE-tomography, 3D elemental images, main elements only. Modification: Proton Beam Writing (PBW), photo resists, semiconductors, 2D- and 3D-microstructures, creating magnetic order in graphite; Proton Beam Sculpting, 3D-microstructures with complex morphology; Targeted irradiation of living cells with counted ions, low dose radiation research.

Examples for all techniques will be given. The requirements for the application of these ion beam techniques will be discussed. Advantages compared to electron microprobes will be addressed as well as limitations, e.g. the issue of radiation damage. At present, lateral resolutions below 100 nm are achievable by STIM and about 350 nm by PIXE. Minimum detection limits depend on the element and can be as low as 0.1µg/g. Microstructures with feature sizes in the order of 100 nm can be created.