Dresden 2011 – wissenschaftliches Programm

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MM: Fachverband Metall- und Materialphysik

MM 12: Postersitzung I

MM 12.7: Poster

Montag, 14. März 2011, 17:30–19:00, P5

Vitreous tantalum oxide films on glassy tantalum thin film — •Michael Scheele, Kevin Stella, and Detlef Diesing — Fakultät für Chemie, Universität Duisburg-Essen, D-45117 Essen, Germany

Thin amorphous tantalum films are prepared on Si(111) substrates in a metallic glassy state. The amorphous monoatomic state of the film is characterized by X-ray diffraction studies. The glassy state leads to a negative temperature coefficient of the resistivity (TCR) for low sample temperatures < 200  K which is attributed to incipient localization. Above 200  K a positive TCR is observed as expected for a normal Boltzmann transport regime. The glassy metal tantalum can be oxidized by an electrochemical method, forming a vitreous highly temperature stable tantalum oxide. These oxides can be used as an internal barrier in thin film electronic devices.