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MM: Fachverband Metall- und Materialphysik

MM 14: Topical Session TEM IV

MM 14.1: Topical Talk

Dienstag, 15. März 2011, 11:00–11:30, IFW A

Transmission Electron Microscopy at 20 kV for Imaging and Spectroscopy - Current Status and Future Prospects — •U. Kaiser¹, J. Biskupek¹, J.C. Meyer¹, J. Leschner¹, L. Lechner¹, Z. Lee¹, S. Kurasch¹, U. Golla-Schindler¹, M. Kinyanjui¹, H. Rose¹, M. Stöger-Pollach², A.N. Khlobystov³, M. Haider⁴, P. Hartel⁴, H. Müller⁴, S. Eyhusen⁵, and G. Benner⁵ — ¹Central Facility of Electron Microscopy, Ulm University, Germany — ²USTEM, Vienna University of Technology, Austria — ³University of Nottingham, United Kingdom — ⁴CEOS GmbH, Heidelberg, Germany — ⁵Carl Zeiss NTS GmbH, Germany

We demonstrate the feasibility of a transmission electron microscope for direct spatial imaging and spectroscopy using electrons with energy in the range between 20 and 80keV. The highly stable instrument is equipped with an electrostatic monochromator, an imaging energy filter and a CS-corrector. High image contrast is obtained at 20 kV. Using this voltage, we have shown the transfer of the 213 pm lattice structure of single-layer graphene and of the 200 reflections (271.5 pm) of 4 nm thick Si layers. Moreover, radiation-sensitive fullerenes (C60) within a carbon nanotube container withstand at 20kV an about two orders of magnitude higher electron dose than at 80 kV. In spectroscopy mode we show that the quasi-monochromatic low-energy electron beam enables the acquisition of EELS spectra with exceptionally low background noise.