Dresden 2011 – scientific programme
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MM: Fachverband Metall- und Materialphysik
MM 14: Topical Session TEM IV
MM 14.4: Talk
Tuesday, March 15, 2011, 12:15–12:30, IFW A
Applications of CS-corrected TEM in metal nitride hard coating materials — •Zaoli Zhang1, Boriana Roshkava1, Rostislav Daniel2, Christian Mitterer2, Gerhard Dehm1,2, Petr Lazar3, Josef Redinger3, and Raimund Podloucky4 — 1Erich Schmid Institute of Materials Science, Austrian Academy of Sciences — 2Department Materials Physics, University of Leoben, Leoben, Austria — 3Institute of General Physics, Vienna University of Technology, Vienna, Austria — 4Department of Physical Chemistry, University of Vienna, Vienna, Austria
Using CS-corrected HRTEM), electron energy loss spectroscopy (EELS), and ab-initio density functional theory (DFT) the interface microstructures of VN (CrN)/MgO (001) are closely examined. By HRTEM, we show an atomic resolution structure of epitaxially grown VN film on MgO (CrN/MgO, CrN/Cr/Si) with a clearly resolved oxygen and nitrogen sub-lattice across the interface. As revealed by DFT calculation, the (002) interplanar spacing oscillates in the first several VN layers across the interface. Interfacial chemistry determined by EELS shows the preponderance of O and V atom at the interface of VN/MgO, and V-L2,3 at the interface show a small detectable core-level shift. A clear energy shift of Cr-L2,3 at CrN/Cr/Si interface is observed, Cs-corrected HRTEM images reveal the presence of one interlayer(Cr2N), which leads to the chemical shift of Cr-L2,3.