Dresden 2011 – scientific programme
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O: Fachverband Oberflächenphysik
O 25: [DS] Progress in Micro- and Nanopatterning: Techniques and Applications I (Focused Session, jointly with O - Organisers: Graaf, Hartmann)
O 25.2: Topical Talk
Tuesday, March 15, 2011, 11:30–12:00, GER 37
Electrochemical Microstructuring — Xinzhou Ma1,2, Vadym Halka1,2, and •Rolf Schuster1,2 — 1Physical Chemistry, Karlsruhe Institute of Technology, Karlsruhe, Germany — 2Center for Functional Nanostructures, Karlsruhe, Germany
Small metallic structures of nanometer dimensions are mostly fabricated by lithographic methods, eventually followed by metal deposition under UHV conditions. Recently also electrochemical methods became very promising for microfabrication, because the number of steps involved in the fabrication process may be significantly reduced. However, often the application of conventional electrochemical methods is hampered by long range charging of the double layer and the weak spatial confinement of electrochemical reactions.
In this contribution we review recent methods by which the constraints of conventional electrochemical methods can be circumvented and which allow to structure surfaces on the micrometer to nanometer scale. These approaches are for example based on putting geometrical constraints, using small tools in combination with controlled nucleation or mechanical detachment of metal clusters from the tool or by locally charging the electrochemical double layer upon application of short potential pulses. Also first results on electron beam induced metal deposition from a thin electrolyte film will be presented.