Dresden 2011 – scientific programme

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O: Fachverband Oberflächenphysik

O 31: Nanostructures at surfaces: Dots, particles, clusters, arrays II

O 31.6: Talk

Tuesday, March 15, 2011, 12:30–12:45, WIL C107

Fabrication of plasmonic nanostructures for efficiency enhancement of silicon solar cells — •Stefan Griesing, Andreas Englisch, Uwe Schmitt, and Uwe Hartmann — Inst. of Experimental Physiks, Saarland University, P.O. Box 151150, 66041 Saarbrücken

Plasmonic scatterers cause an increase of the light-conversion efficiency of silicon solar cells due to the extended light path. Especially nanostructures with a diameter of more than 100nm scatter a large fraction of the incoming irradiation in the wavelength regime of 550nm to 1050nm. A technical challenge is the fabrication of large homogeneous areas of plasmonic nanostructures with a narrow size distribution. We report an approach in which this is realized by sputtering or thermal evaporation of silver thin films (5- 20nm thickness) and subsequent vacuum annealing. SEM images show that size, shape and density of the particles are dependent on the annealing temperature and the mass thickness of the deposited layer. In addition, in-situ SEM measurements of the annealing process will be presented.