Dresden 2011 – scientific programme
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O: Fachverband Oberflächenphysik
O 36: Poster Session II (Metals; Nanostructures at surfaces; Surface or interface magnetism; Spin-Orbit Interaction at Surfaces; Electron and spin dynamics; Surface dynamics; Methods; Theory and computation of electronic structure)
O 36.14: Poster
Tuesday, March 15, 2011, 18:30–22:00, P4
Electrospray Ion Beam Deposition for Scanning Tunneling Microscopy Studies in Ultrahigh Vacuum — •Gordon Rinke1, Stephan Rauschenbach1, Nicha Thontasen1, Zhitao Deng1, Nicola Malinowski1, and Klaus Kern1,2 — 1Max Planck Institute for Solid State Research, Heisenbergstrasse 1, 70569 Stuttgart, Germany — 2Institut de Physique de la Matiere Condensee, Ecole Polytechnique Federale de Lausanne, 1015 Lausanne, Switzerland
The deposition of complex molecules in vacuum is an important technological step towards applications. In recent years, electrospray ion beam deposition (ES-IBD) was developed in our laboratory as a technique for the deposition of molecular layers of nonvolatile molecules on well defined surfaces in ultrahigh vacuum.[1,2] Thereby the key mechanism is the creation of molecular ions or clusters, which deposited on surfaces result in the growth of molecular nanostructures or films.
Here we show that this technique has now matured into a ready tool for surface scientists to prepare a great variety of surface coatings with unprecedented control. By employing state of the art ion optics, ES-IBD offers mass-selection, deposition energy control and coverage monitoring as features that are intrinsic to the process. We demonstrate the versatility of the deposition method by showing surface coatings of highest quality from molecular magnets (Mn12), proteins, host-guest compounds, dye molecules and membrane like layers.[2,3]
[1] Small 2 (2006), pg. 540
[2] ACS Nano 3 (2009), pg. 2901
[3] J. Phys. Chem. C 114 (2010), pg. 17768