Dresden 2011 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
O: Fachverband Oberflächenphysik
O 59: Poster Session III (Nanotribology; Polymeric biomolecular films; Organic electronics and photovoltaics, Covalent networks on surfaces; Phase transitions; Particles and clusters; Transparent conductive oxides)
O 59.15: Poster
Mittwoch, 16. März 2011, 17:30–21:00, P3
Post-deposition annealing induced reduction of γ-Fe2O3 ultra thin films studied by XRD — •Florian Bertram1, Carsten Deiter1, Kathrin Pflaum1, Matrin Suendorf2, Christian Otte2, and Joachim Wollschläger2 — 1Hamburger Synchrotronstrahlungslabor am Deutschen Elektronen-Synchrotron, Notkestr. 85, 22607 Hamburg — 2Fachbereich Physik, Universität Osnabrück, Barbarastr. 7, 49069 Osnabrück
Due to their magnetic and catalytic properties iron oxide thin films are of interest for both applications and fundamental research. In both cases precise control of the oxide phase is crucial. Here, we present the effect of the post deposition annealing (PDA) in high vacuum on a 8nm γ-Fe2O3 film epitaxially grown by molecular beam epitaxy on MgO(001). The reduction from γ-Fe2O3 to FeO could be monitored by in-situ XRD measurements at the MgO (002) bulk reflection. By these measurements we could show that the reduction is occurring in two steps. First the film is reduced to Fe3O4 with the phase transition completed around 360∘C. Afterwards the film is reduced to FeO which is completed at about 410∘C.