Dresden 2011 – scientific programme

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O: Fachverband Oberflächenphysik

O 60: Poster Session IV (Solid/liquid interfaces; Semiconductors; Oxides and insulators; Graphene; Plasmonics and nanooptics; Electronic Structure; Surface chemical reactions; Heterogeneous catalysis)

O 60.109: Poster

Wednesday, March 16, 2011, 17:30–21:00, P4

Monitoring and adjusting the temperature of ultra-thin metal catalysts in situ — •Ievgen Nedrygailov, Kevin Stella, Cordelia Soostmeyer, Eckart Hasselbrink, and Detlef Diesing — Fakultät für Chemie, Universität Duisburg-Essen, D-45117 Essen, Germany

Despite the widespread usage of metal thin films in surface science experiments, the in situ measurement of the thin film temperature using traditional methods remains challenging. To address this problem the technique of adjusting and measuring the temperature of metal thin films by passing an electric current through them is proposed. The current flowing directly through the thin film serves for both: Joule heating of the thin film and monitoring the temperature using the temperature dependence of the thin film resistance. Direct heating is used to clean the platinum thin films (15-20 nm) on top of the silicon based electronic devices under ultra high vacuum conditions. Temperature programmed desorption of water and CO molecules from the polycrystalline platinum surface of the devices is studied to characterize the chemical state of the device surface.