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O: Fachverband Oberflächenphysik

O 60: Poster Session IV (Solid/liquid interfaces; Semiconductors; Oxides and insulators; Graphene; Plasmonics and nanooptics; Electronic Structure; Surface chemical reactions; Heterogeneous catalysis)

O 60.44: Poster

Mittwoch, 16. März 2011, 17:30–21:00, P4

Controlled fabrication of nanocrystalline graphene films on insulating substrates — •Nils-Eike Weber¹, Rainer Stosch², Armin Gölzhäuser¹, and Andrey Turchanin¹ — ¹Physik supramolekularer Systeme und Oberflächen, Fakultät für Physik, Universität Bielefeld — ²Physikalisch-Technische Bundesanstalt, Braunschweig

We report on the fabrication and characterization of nanocrystalline graphene films on insulating substrates. Graphenoid (graphene like) carbon nanosheets with a thickness of 1 nm were made by the electron beam induced cross-linking of aromatic self-assembled monolayers. When transferred onto insulating substrates, the graphenoid sheets were converted into nanocrystalline graphene by thermal annealing. We used thermal annealing in an argon atmosphere to produce large area (cm square or larger) films of nanocrystalline graphene with a well defined thickness on silicon oxide wafers and quartz glass. The electrical conductivity was measured at room temperature by four point probe measurements. The structure and chemical composition were studied by X-ray photoelectron and Raman spectroscopies. Since the electrical conductivity, thickness and optical properties of the graphene films can be well controlled, the suggested method opens broad prospects for the fabrication of transparent conductive coating.