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O: Fachverband Oberflächenphysik

O 69: Electronic structure I

O 69.6: Vortrag

Donnerstag, 17. März 2011, 12:30–12:45, WIL C107

Interplay between morphology and electronic structure of ultrathin Ni films on W(110) — •Henry Wortelen¹, Sebastian Stolwijk¹, Anke B. Schmidt¹, Kristian Döbrich², Martin Weinelt^2,3, and Markus Donath¹ — ¹Physikalisches Institut, Westfälische Wilhelms-Universität Münster, 48149 Münster — ²Max-Born-Institut, 12489 Berlin — ³Fachbereich Physik, Freie Universität Berlin, 14195 Berlin

For Ni, a prototype band ferromagnet, measurements of the electronic structure at the phase transition suffer from dominant temperature-induced linewidth broadening. This hampers the interpretation of experimental results. An effective way to overcome this problem is to lower the Curie temperature by going from bulk samples to ultrathin films.

In this contribution, we present morphological and electronic structural changes of ultrathin Ni films grown on a W(110) substrate, as the film thickness is reduced from 10 to 1 monolayer. A combined study with scanning tunneling microscopy, low-energy electron diffraction and (inverse) photoemission shows the close relation between film thickness, quality and electronic structure. Particular attention is given to crystal-induced and image-potential surface states due to their surface sensitivity.