Kiel 2011 – scientific programme
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P: Fachverband Plasmaphysik
P 12: Plasmatechnologie I
P 12.2: Talk
Wednesday, March 30, 2011, 11:00–11:15, HS H
Formation of nanocomposites by cluster deposition and plasma polymerization — •Tilo Peter1, Vladimir Zaporojtchenko1, Stefan Rehders1, Thomas Strunskus1, Sven Bornholdt2, Holger Kersten2, and Franz Faupel1 — 1Institute for Materials Science, Kiel, Germany — 2Institute of Experimental and Applied Physics, Kiel, Germany
Recently, there is much interest in nanocomposites consisting of metal nanoparticles dispersed in a dielectric matrix due to their novel functional properties [1]. In many cases the formation of clusters occurs by co-deposition of metal and matrix. This process is affected by chemical reactions with the matrix material during deposition [2]. The integration of a magnetron cluster source into a plasma deposition process allows the pre formation of clusters in the gas phase and subsequent co-deposition with the matrix. Here we focus on the properties of Ag clusters and the subsequently obtained nanocomposites by embedding in a polymer matrix which is prepared by plasma polymerization of Hexamethyldisiloxane (HMDSO). The deposition system consists of two main components: A magnetron sputter source in a separate high-pressure Ar atmosphere acting as a cluster source. And a rf-powered Ar/O2 plasma, that is used for plasma polymerization of HMDSO. The influence of deposition parameters on the morphology and nanocomposite film properties were investigated by x-ray photoelectron spectroscopy, transmission electron microscopy and UV/Vis spectroscopy.
[1] Faupel,F. et.al., Contrib. Plasma Phys. 47(2007), 537.
[2] Faupel,F. et.al., Adv. Eng. Mater. (2010) accepted.