Kiel 2011 –
scientific programme
P 12: Plasmatechnologie I
Wednesday, March 30, 2011, 10:30–12:30, HS H
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10:30 |
P 12.1 |
Invited Talk:
Modellierung eines Radio-Frequenz Plasmabrückenneutralisators — •Frank Scholze, Michael Tartz und Horst Neumann
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11:00 |
P 12.2 |
Formation of nanocomposites by cluster deposition and plasma polymerization — •Tilo Peter, Vladimir Zaporojtchenko, Stefan Rehders, Thomas Strunskus, Sven Bornholdt, Holger Kersten, and Franz Faupel
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11:15 |
P 12.3 |
Hydrophilic finishing of LDPE films using plasma treatment — •Dieter Ihrig, Jens Eggemann, Richard Schuhmacher, and Michael Licht
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11:30 |
P 12.4 |
Modification of polydimethylsiloxane thin films in H2 CCRF plasma studied by IR reflection absorption spectroscopy — •Vladimir Danilov, Hans-Erich Wagner, and Jürgen Meichsner
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11:45 |
P 12.5 |
Pulse magnetron sputtering of oxide films for mechanical, biomedical and optical applications — •Heidrun Klostermann
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12:00 |
P 12.6 |
Ar als Sonde für die Untersuchung struktureller Eigenschaften dünner Schichten mittels XPS — •Atena Rastgoo Lahrood, Marina Prenzel, Teresa de los Arcos und Jörg Winter
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12:15 |
P 12.7 |
Mechanismen des Schichtwachstums - Untersuchung mittels Monte-Carlo Simulationen — •Evelyn Häberle, Andreas Mutzke, Ralf Schneider, Andreas Schulz, Matthias Walker und Ulrich Stroth
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