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P: Fachverband Plasmaphysik

P 7: Poster: Modellierung und Simulation von Niederdruckplasmen

P 7.2: Poster

Dienstag, 29. März 2011, 17:00–19:00, Foyer

The dynamics of the RF sheath in Capacitively Coupled Plasmas — •Mohammed Shihab, Dennis Ziegler, and Ralf Peter Brinkmann — Ruhr-Universität Bochum, Lehrstuhl für Theoretische Elektrotechnik, 44801 Bochum

The dynamics of the sheath formed in front of a radio frequency (RF) powered electrode controls the energy and angular distribution of ions bombarding the electrode, which in turn affects the deposition rate, etch rate, and etch anisotropy.

In this contribution, we introduce a self consistent model which is able to resolve the ion dynamics in the intermediate RF frequency regime. The effect of ion modulation on plasma parameters like for example the charge within the sheath, the electric field, and the ion energy distribution will be discussed. The model is able to describe realistic process conditions (external bias voltage, nonharmonic modulation of the periodic sheath potential, and the interaction with the neutral background gas) is computationally efficient and at the same time numerically stable.

The financial support from the Federal Ministry of Education and Research within the frame of the project "Plasma Technology Grid" and the support of the DFG via the collaborative research center SFB-TR87 is gratefully acknowledged.