Kiel 2011 – scientific programme
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P: Fachverband Plasmaphysik
P 9: Poster: Diagnostik technischer Plasmen
P 9.13: Poster
Tuesday, March 29, 2011, 17:00–19:00, Foyer
Time-resolved diagnostics of pulsed sputtering discharges — •Steffen Drache1, Vitezslav Stranak1, Ann-Pierra Herrendorf1, Robert Bogdanowicz1, Harm Wulff1, Zdenek Hubicka2, and Rainer Hippler1 — 1University of Greifswald, Institute of Physics, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany — 2Academy of Sciences of the Czech Rep., Institute of Physics, Na Slovance 2, 18221 Prague 8, Czech Republic
The temporal evolution of ionized species in pulse-operated Ti-Cu-magnetron sputtering discharges and inductively coupled electron cyclotron wave resonance (ECWR) discharges is presented and compared. The optical methods and measurements of ion velocity and energy distribution functions were applied for discharge characterization. Optical emission spectroscopy (OES) served for identification of active plasma species. Optical emission imaging (OEI) was used for investigation of temporal and spatial development of the discharge during the active part of the pulse and in configuration with optical filters allows dynamic study of discharge ignition. Time resolved retarding field analyzer (RFA) measurements were performed to determine the ion velocity distribution function (IVDF). IVDF is considered as a main parameter which influences the growth and properties of thin films. Time resolved IVDF measured near by a cathode are compared time-averaged measurements in the substrate position. IVDF measurement are compared with ion energy distribution function (IEDF) measured by energy resolved mass spectrometer.