Kiel 2011 – scientific programme
Parts | Days | Selection | Search | Updates | Downloads | Help
SYPG: Symposium Plasmatechnologie-Grid
SYPG 1: Plasma-Technologie-Grid - Perspektiven der Plasmasimulation in der Grid-Infrastruktur
SYPG 1.4: Invited Talk
Thursday, March 31, 2011, 15:00–15:20, HS C
Parallel Particle-in-Cell Monte-Carlo simulation of rarefied gas flow dynamics and gas discharges — •Andreas Pflug1, Christoph Schwanke1, Michael Siemers1, Bernd Szyszka1, and Jan Niemann2 — 1Fraunhofer Institute for Surface-Engineering and Thin Films IST, Braunschweig, Germany — 2GNS Systems GmbH, Braunschweig, Germany
Low pressure gas discharges are relevant for thin film coating technologies such as magnetron sputtering or plasma enhanced chemical vapour deposition (PECVD). Due to the increasing demand on throughput and precision, the development of improved deposition sources by pure empirical methods becomes more and more elaborate.
In order to increase the efficiency in development new coating technologies, we have developed a parallel Particle-in-Cell Monte-Carlo (PIC-MC) simulation environment suited for description of rarefied gas dynamics and low-pressure gas discharges.
In the course of a BMBF funded project "PT-GRID", the parallelization and scaling behaviour of this software has been considerably improved, furthermore the software has been prepared for Grid computing.
In the present work we show parallel computations of rarefied gas dynamics and magnetron sputter discharges in Ar/O2 gas mixtures in comparison with experimental data. The scaling behaviour of different field solver and parallelization concepts tested during development of the PIC-MC simulation environment are shown in comparative benchmarks.