Münster 2011 – scientific programme
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HK: Fachverband Physik der Hadronen und Kerne
HK 39: Instrumentierung - Poster
HK 39.32: Poster
Wednesday, March 23, 2011, 14:00–16:00, Foyer Chemie
Optimization of a sputtering chamber for the production of neutron optical components — •Hans-Christian Koch1, Alexander I. Frank2, Werner Heil1, Mounir Kaoui1, Jan Karch1, Andreas Kraft1, Thorsten Lauer1, Daniel Neumann1, Yury Sobolev1, and Andreas Weinand1 — 1Institut für Physik, Universität Mainz — 2Frank Laboratory of Neutron Physics, Joint Institute for Nuclear Research, Dubna, Russia
A computer controlled sputtering chamber for coatings with high precision and homogeneity on large area surfaces was installed at the UCN group of the Institute of Physics, Mainz University. With this device sandwich-like structures of alternating materials, e.g. Nickel and Titanium, can be deposited on flat substrates. These structures have applications as neutron optical components in fundamental experiments with UCN. This talk will outline the steps taken to achieve homogeneous and reproducible multilayer coatings and give a brief example for an application in a current UCN experiment.