Berlin 2012 – scientific programme
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 1: Interfaces and Thin Films I
CPP 1.1: Topical Talk
Monday, March 26, 2012, 09:30–10:00, C 130
Local anodic oxidation nanolithography on alkyl-terminated silicon surfaces: Chemical routes towards functional nanostructures — •Harald Graaf1,2, Maik Vieluf1, and Thomas Baumgärtel1 — 1Chemnitz University of Technology, Institute of Physics, Germany — 2Kassel University, Institute of Chemistry, Germany
The structuring of surfaces on a nanometer scale is one of the demands that have to be fulfilled in order to advance the design and to aspire to miniaturisation in semiconductor technologies. Besides further development of conventional optical lithography, alternative lithography techniques are in the focus of recent research to achieve lateral structures on the nanometer scale. Here scanning probe based lithography (SPL) is one of the emerging fields. One SPL approach is the local anodic oxidation (LAO) where a voltage is applied between scanning probe microscopy (SPM) tip and sample surface leading to an electrochemical oxidation reaction. In the case of an (alkyl-terminated) silicon sample, the silicon is oxidized locally at the tip apex forming silicon oxide structures. The chemically different oxide can afterwards be altered through the attachment of molecules or nanoparticles in order to give the structures a defined functionality. In this talk, basics of the LAO technique will be introduced and an overview will be given of the research in that field both regarding the understanding of the process itself as well as possible applications to generate functionalized structures. This contribution will thereby deal on the optical properties of prepared functional nanostructures.