Berlin 2012 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 10: Interfaces and Thin Films II

CPP 10.9: Vortrag

Dienstag, 27. März 2012, 12:00–12:15, C 130

Homogeneous and patterned deposition from a meniscus of an evaporating suspension onto a moving substrate — •Hender Lopez and Uwe Thiele — Department of Mathematical Sciences, Loughborough University, Leicestershire LE11 3TU, UK

A dynamical model is used to study the deposition process observed when an inclined plate is drawn from a bath of a volatile solution or suspension. Based on the gradient dynamics formulation proposed by Thiele [Eur. Phys. J. Special Topics 197, 213 (2011)] we derived two coupled equations that describe the film height profile and mean solute concentration. These equations were solved numerically for a large parameter set and the effect of the plate velocity, U, was studied systematically. Our model captures the two main regimens that have been observed in a wide range of experimental setup): at low U, the deposit thickness decreases with U (evaporative regime), and at high U, the deposit thickness increases with U (Landau-Levich regime). An important feature is that for a range of U in the evaporative regime we observe a stick-slip motion of the contact line that is related to the formation of regular lines deposits. This phenomenon is frequently reported in experiments, but often not covered by previous models. We acknowledge support by the EU (PITN-GA-2008-214919).