Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 1: Layer properties: electrical, optical, and mechanical properties

DS 1.3: Vortrag

Montag, 26. März 2012, 10:00–10:15, H 0111

In Situ-Controlled Oxidation of High-Speed Surface Emitting Lasers and Single-Photon Sources — •Gunter Larisch, Werner Hofmann, and Dieter Bimberg — Institute of Solid State Physics & Center of Nanophotonics, Technische Universität Berlin

Precise control of the oxidation progress is needed for the production of the apertures of oxid-confined VCSELs and single photon sources [1]. So far, the size of the aperture was determined by ex situ measuring of the electrical resistance of oxidized test samples [2]. This method proved to be very time consuming and not reliable. Therefore, an optical in situ method was developed that will be presented here. Problems such as vibration-free mounting of the microscope (used for imaging) and high-contrast fluoroscopy of the top DBR with a suitable light source are presented and illustrated with examples. Test structures adapted to the new method are introduced and discussed. The improved process of oxidation control allows the visualization of the progress of oxidation during the oxidation. This enables a significant reduction of processing time and cost. In addition, a higher yield of precision components processed by increasing the processing accuracy is achieved.

[1] Mutig, A. et al.: "Progress on High-Speed 980 nm VCSELs for Short-Reach Optical Interconnects," IEEE J. Sel. Top. Quantum Electron., 2011. [2] Choquette, K. et al.: "Advances in Selective Wet Oxidation of AlGaAs Alloys," IEEE J. Sel. Top. Quantum Electron., 1997.