Berlin 2012 – scientific programme

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DS: Fachverband Dünne Schichten

DS 15: Organic electronics and photovoltaics: simulations and optics I (jointly with CPP, HL, O)

DS 15.6: Talk

Tuesday, March 27, 2012, 10:45–11:00, H 2032

A new differential reflectance spectroscopy method with enhanced sensitivity — •Harald Zaglmayr, Lidong Sun, and Peter Zeppenfeld — Institute of Experimental Physics, Johannes Kepler Univeristät, Linz, Austria

Differential reflectance spectroscopy (DRS), measures the normalized difference of the reflectance of the bare and adsorbate covered surface, respectively. The technique possesses enhanced surface sensitivity and is thus widely used for the in-situ study of organic thin film growth [1,2]. The signal to noise ratio of the obtained spectra, which determines the sensitivity of the method, strongly depends on the stability of the light source. Here, we introduce a new method to overcome the influence of the instability of the light source by normalizing the spectrum of the reflected beam with that of the incident beam, which are measured simultaneously. Our approach shows a drastic improvement of the signal to noise ratio of the DR spectra. The new instrument has been successfully applied to monitor the in-situ growth of alpha-sexithiophene (α-6T) and cobalt-tetramethoxyphenylporphyrin (Co-TMPP) on the Cu(110)-(2x1)O reconstructed surface. The details of the technical realization and the scientific results concerning the organic thin film growth will be reported in this contribution.

[1] R.Forker, T.Fritz; Phys. Chem. Chem. Phys., 2009, 11, 2142-2155

[2] U.Heinemeyer et al.; Phys. Rev. Lett., 2001, 104, 257401