Berlin 2012 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 20: Application of thin films
DS 20.3: Vortrag
Mittwoch, 28. März 2012, 10:00–10:15, H 0111
Fabrication of multilayer Laue lenses for high resolution hard x-ray microscopy — •Liese Tobias1, Radisch Volker1, Ruhlandt Aike2, Krüger Sven Philip2, Giewekemeyer Klaus2, Osterhoff Markus2, Salditt Tim2, and Krebs Hans-Ulrich1 — 1Institut für Materialphysik, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany — 2Institut für Röntgenphysik, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
High resolution microscopy using both soft and hard x-rays is highly useful for biological and material sciences. Especially for spatial resolutions in the 10 nm range, highly-precise optical devices like Kirkpatrick-Baez mirrors, waveguides, compound refractive lenses or zone plates are required. As an alternative to conventional zone plates, also multilayer structures are applied, mostly fabricated by sputter-slice technique so far. However, multilayer zone plates (MZP) and Laue lenses (MLL) can also be fabricated by a combination of pulsed laser deposition (PLD) and focused ion beam (FIB) [1,2]. In this contribution, we show the design of a multilayer Laue lens for efficient focusing of hard x-rays in one dimension, the necessary optimization steps for the W/Si multilayer deposition, and the FIB fabrication from the deposited multilayer. First synchrotron experiments demonstrate the application for high resolution microscopy below 10 nm.
[1] T. Liese, V. Radisch and H.-U. Krebs, Rev. Sci. Instr. 81 (2010) 073710; [2] T. Liese,V. Radisch, I. Knorr, M. Reese, P. Großmann, K. Mann and H.-U. Krebs, Appl. Surf. Sci. 257 (2011) 5138.