Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 21: Micro- and nanopatterning (jointly with O)

DS 21.4: Vortrag

Mittwoch, 28. März 2012, 12:30–12:45, H 0111

Innovative FIB specific Nanopatterning Strategies for Optimized Photonic Crystal Nanofabrication — •Frank Nouvertne and Achim Nadzeyka — Raith GmbH, Konrad Adenauer Allee 8, D-44263 Dortmund, Germany

The physical interactions underlying ion beam lithography (IBL) are quite complex as it brings in both sputtering and redeposition effects. Sputtering, the key mechanism for focused ion beam milling, is a complex process that depends on several factors, such as crystal orientation, surface topography, surface diffusion, ion implantation, and the stoichiometry of the solid. Redeposition is a less desirable mechanism that is ubiquitous in focused ion beam milling and has a similar complexity as sputtering. These additional physical complexities associated with the IBL technique call for more flexible beam deflection strategies than are typically available for EBL.

This talk will focus on the optimization of a photonic crystal fabricated by a FIB milling process, controlled by ELPHY MultiBeam, a new generation of nanofabrication pattern generators (PG). This newly developed PG allows for a huge variety of different directional and repetitive patterning strategies, which - in combination with a dedicated automatic drift compensation functionality - enables the required, most precise pattern placement accuracy and highest stability for this long term photonic crystal nanofabrication process over several hours.