Berlin 2012 –
wissenschaftliches Programm
DS 22: Trends in atomic layer deposition I (Focused session – Organizer: Nielsch)
Mittwoch, 28. März 2012, 15:00–17:15, H 0111
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15:00 |
DS 22.1 |
Hauptvortrag:
Trends in Atomic Layer Deposition — •Helmut Baumgart
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15:30 |
DS 22.2 |
Topical Talk:
Energy conversion devices made using ALD — •Julien Bachmann
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16:00 |
DS 22.3 |
Topical Talk:
Role of substrate chemistry in ALD revealed by in-situ techniques — •Massimo Tallarida, Marcel Michling, Chittaranjan Das, Daniel Friedrich, Matthias Städter, and Dieter Schmeisser
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16:30 |
DS 22.4 |
Highly Efficient Embedded Transmission Gratings — Stephan Ratzsch, •Frank Fuchs, Adriana Viorica Szeghalmi, Ernst-Bernhard Kley, and Andreas Tünnermann
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16:45 |
DS 22.5 |
Optical applications of atomic layer deposition thin films — •Adriana Szeghalmi, Thomas Weber, Mato Knez, Ernst Bernhard Kley, and Andreas Tünnermann
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17:00 |
DS 22.6 |
Templated ALD for Synthesis of Magnetic Nanotube Suspensions — •Robert Zierold, Zhenyu Wu, Carl E. Krill III, and Kornelius Nielsch
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