Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 23: Trends in atomic layer deposition II (Focused session – Organizer: Nielsch)

DS 23.2: Topical Talk

Mittwoch, 28. März 2012, 18:00–18:30, H 0111

Uniform ZnMnO and ZnCoO films grown by Atomic Layer Deposition — •Marek Godlewski^1,2, Małgorzata Łukasiewicz¹, Aleksandra Wójcik-Głodowska¹, Elzbieta Guziewicz¹, and Bartłomiej Witkowski¹ — ¹Institute of Physics PAS, Al. Lotników 32/46, 02-668 Warsaw, Poland — ²Dept. Mathematics and Natural Sciences College of Science, UKSW, Dewajtis 5,

Despite many efforts, origin of a ferromagnetic (FM) response in ZnMnO and ZnCoO is still not clear. It is believed that FM response reported for these two alloys is due to inclusions of foreign phases (TM oxides), defects or metal accumulations, rather than volume properties of investigated samples. Thus, control of uniformity of investigated samples is crucial.

Atomic Layer Deposition (ALD) enables deposition of uniform ZnMnO and ZnCoO films. This is possible by reduction of a growth temperature, selection of Mn and Co precursors, and use of optimized ratios of the relevant ALD cycles, as will be discussed in details. Importantly, uniform films of ZnMnO and ZnCoO remain paramagnetic even at increased concentration of magnetic ions. Magnetic investigations show the FM response for films deposited on purpose with a non-uniform Mn (Co) distribution. This enables us to discuss the origin of FM in ZnMnO and ZnCoO.

The research was partially supported by the grant Innovative Economy (POIG.01.01.02-00-008/08) and FunDMS Advanced Grant.