Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 26: Thin film characterization: structure analysis and composition (Ion assisted methods and analysis)

DS 26.6: Vortrag

Mittwoch, 28. März 2012, 16:15–16:30, H 2032

Characteristics of TiCrN films deposited by inductively coupled plasma assisted DC magnetron sputtering — •Byungchul Cha, Ahram Kwon, Uoochang Jung, and Hyungho Jo — Korea Institute of Industrial Technology, 1274, Jisa-Dong, Gangseo-Gu, Busan 618-230, Korea

In this study, Titanium Chromium Nitride (TiCrN) films were deposited on 316L stainless steel by inductively coupled plasma assisted DC magnetron sputtering. The effects of the N2/Ar gas ratio and the power of the ICP source on the properties of the TiCrN films were investigated. The thickness of films decreased with the increase nitrogen content in the inlet gas. The TiCrN film deposited at the 0.3 gas ratio showed maximum hardness of 3900 HK0.3 and excellent corrosion resistance. Increasing the ICP power during the sputtering, the hardness and the compressive stress of the TiCrN films increased, but the thickness of the films decreased linearly. XRD results of the TiCrN films showed the preferred orientation of (111), (200) and (220). The surface roughness of the TiCrN films analyzed by atomic force microscope decreased with the increase ICP power.