DS 26: Thin film characterization: structure analysis and composition (Ion assisted methods and analysis)
Mittwoch, 28. März 2012, 15:00–16:30, H 2032
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15:00 |
DS 26.1 |
(contribution withdrawn (duplicate of DS 21.1)) Investigation of the effect of the incorporated Fe atoms in the ion-beam induced nanopatterns on Si (001) — •behnam Khanbabaee, Andreas Biermanns, Marina Cornejo, Frank Frost, and Ullrich Pietsch
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15:15 |
DS 26.2 |
Pattern transfer on fused silica samples using sub-aperture reactive ion beam etching — •André Miessler and Thomas Arnold
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15:30 |
DS 26.3 |
In situ X-Ray Reflectivity measurements during DC Sputtering of Vanadium Carbide thin films — •Marthe Kaufholz, Baerbel Krause, Sunil Kotapati, Sven Ulrich, Michael Stüber, and Tilo Baumbach
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15:45 |
DS 26.4 |
Composition and microstructure of r.f. magnetron sputter-deposited Cr-Zr-O thin films — •Stefanie Spitz, Michael Stüber, Harald Leiste, and Sven Ulrich
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16:00 |
DS 26.5 |
Sputter Yield Amplification upon reactive sputtering of TiO2 — •Rüdiger M. Schmidt, Tomas Kubart, Michael Austgen, Dominik Wagner, Thomas Nyberg, Andreas Pflug, Sören Berg, and Matthias Wuttig
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16:15 |
DS 26.6 |
Characteristics of TiCrN films deposited by inductively coupled plasma assisted DC magnetron sputtering — •Byungchul Cha, Ahram Kwon, Uoochang Jung, and Hyungho Jo
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