Berlin 2012 –
wissenschaftliches Programm
DS 3: Focused electron beam induced processing for the fabrication of nanostructures I (focused session, jointly with O – Organizers: Huth, Marbach)
Montag, 26. März 2012, 15:00–17:00, H 0111
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15:00 |
DS 3.1 |
Hauptvortrag:
Focused electron beam lithography in the 1-10 nanometer range. — •Cornelis Wouter Hagen
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15:30 |
DS 3.2 |
Topical Talk:
Fabrication of 1 nm thick Carbon Nanomembranes using FEBIP — •Armin Gölzhäuser
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16:00 |
DS 3.3 |
Topical Talk:
Towards a microscopic understanding of the electron beam induced deposition of tungsten — •Harald Jeschke, Kaliappan Muthukumar, Ingo Opahle, Juan Shen, and Roser Valentí
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16:30 |
DS 3.4 |
Proximity Effects in Focused Electron Beam- Induced Processing on Ultra-thin Membranes — Marie-Madeleine Walz, Florian Vollnhals, Florian Rietzler, Michael Schirmer, Hans-Peter Steinrück, and •Hubertus Marbach
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16:45 |
DS 3.5 |
Binary Pt-Si Nanostructures Prepared by Focused Electron-Beam-Induced Deposition — •Marcel Winhold, Christian Schwalb, Fabrizio Porrati, Roland Sachser, Achilleas S. Frangakis, Britta Kämpken, Andreas Terfort, Norbert Auner, and Michael Huth
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