Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 37: Poster II: Focused electron beam induced processing for the fabrication of nanostructures (focused session, jointly with O); Nanoengineered thin films; Layer properties: electrical, optical, and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM, XPS, SIMS, RBS,..); Application of thin films

DS 37.1: Poster

Donnerstag, 29. März 2012, 15:00–17:00, Poster E

FEBIP on organic layer modified Ag(111) — •Patrick Wintrich, Florian Vollnhals, Johannes Zirzlmeier, Hans-Peter Steinrück, and Hubertus Marbach — Lehrstuhl für Physikalische Chemie II and Interdisciplinary Center for Molecular Materials (ICMM), Friedrich-Alexander- University Erlangen-Nuremberg, Egerlandstr. 3, 91058 Erlangen

Electron Beam Induced Deposition (EBID) has attracted increasing interest in the last few decades for the fabrication of nanosized structures. In our investigation of EBID with Fe(CO)₅ on an Ag(111) surface, we observed autocatalytic growth of iron structures on the whole surface, even without electron irradiation. Herein, we show that the initial decomposition can be inhibited by preadsorbing a layer of porphyrin molecules on the Ag(111); consequently, on this surface well-defined Fe nanostructures can be produced via EBID with Fe(CO)₅.

In analogy to the recently introduced EBISA process [1], we also can use the electron beam to locally decompose the porphyrin layer with the electron beam and thereby activate selected areas on the surface for the autocatalytic growth of Fe(CO)₅. We therefore can apply two different fabrication routes for iron deposits on Ag(111). In both, the first step is the deposition of the porphyrin layer. Thereafter, we can either perform the conventional EBID process or we can use the electron beam for the local decomposition of the porphyrin layer followed by the autocatalytic growth of Fe(CO)₅ at the activated areas.

This work was supported by the DFG through grant MA 4246/1-1.

[1] M.-M. Walz et al., Angew. Chem. Int. Ed. 49 (2010), 4669