Berlin 2012 – scientific programme
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DS: Fachverband Dünne Schichten
DS 37: Poster II: Focused electron beam induced processing for the fabrication of nanostructures (focused session, jointly with O); Nanoengineered thin films; Layer properties: electrical, optical, and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM, XPS, SIMS, RBS,..); Application of thin films
DS 37.20: Poster
Thursday, March 29, 2012, 15:00–17:00, Poster E
Study of laser deposited W/Si multilayers for high-resolution transmission X-ray optics — •Christian Eberl, Florian Döring, Tobias Liese, and Hans-Ulrich Krebs — Institut für Materialphysik, Georg-August-University, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
High quality non-periodic W/Si multilayers were pulsed laser deposited (PLD) at 248 nm for the use as high-resolution transmission X-ray optics (multilayer Laue lenses) and studied by thickness monitoring, SEM, TEM, and X-ray reflectometry (XRR). Due to the large difference in melting point, the ablation threshold, deposition rate as well as droplet formation of the both components W and Si strongly differ. Furthermore, during deposition of W/Si multilayers thickness deficits up to 2 nm due to resputtering and WSi2 interlayers occur. Thus, in order to ensure a defined deposition of high-quality multilayers, two distinct element specific sets of optimized preparation conditions had to be worked out. In this contribution, this process of optimization is described in detail and the underlying mechanisms are discussed, also in comparison with SRIM simulations.