Berlin 2012 – scientific programme

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DS: Fachverband Dünne Schichten

DS 37: Poster II: Focused electron beam induced processing for the fabrication of nanostructures (focused session, jointly with O); Nanoengineered thin films; Layer properties: electrical, optical, and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM, XPS, SIMS, RBS,..); Application of thin films

DS 37.27: Poster

Thursday, March 29, 2012, 15:00–17:00, Poster E

Strontium Titanate Thin Film Deposition – Structural and Electronical Characterization — •Florian Hanzig¹, Juliane Hanzig¹, Michael Franke², Hartmut Stöcker¹, Erik Mehner¹, Barbara Abendroth¹, and Dirk C. Meyer¹ — ¹TU Bergakademie Freiberg, Institut für Experimentelle Physik — ²TU Bergakademie Freiberg, Institut für Elektronik- und Sensormaterialien

Strontium titanate is on the one hand a widely-used model oxide for solids which crystallize in perovskite type of structure. On the other hand, with its large band-gap energy and its mixed ionic and electronic conductivity, SrTiO₃ is a promising isolating material in metal-insulator-metal (MIM) structures for resistive switching memory cells. Here, we used physical vapour deposition methods (e. g. electron-beam and sputtering) to produce strontium titanate layers. Sample thicknesses were probed with X-ray reflectometry (XRR) and spectroscopic ellipsometry (SE). Additionally, layer densities and dielectric functions were quantified with XRR and SE, respectively. Using infrared spectroscopy free electron concentrations were obtained. Phase and element composition analysis was carried out with grazing incidence X-ray diffraction and X-ray photoelectron spectroscopy. Subsequent temperature treatment of samples lead to crystallization of the initially amorphous strontium titanate.