Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 37: Poster II: Focused electron beam induced processing for the fabrication of nanostructures (focused session, jointly with O); Nanoengineered thin films; Layer properties: electrical, optical, and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM, XPS, SIMS, RBS,..); Application of thin films

DS 37.43: Poster

Donnerstag, 29. März 2012, 15:00–17:00, Poster E

Pulsed DC Magnetron Sputtered TiO₂ Layers Optimized for Photocatalytic Efficiency — •Bodo Henkel, Thomas Strunskus, Vladimir Zaporojtchenko, Stefan Rehders, and Franz Faupel — Institute for Materials Science, Kiel, Germany

Pulsed DC Magnetron Sputtering was used to produce highly photocatalytically active TiO₂ layers on quartz glass. For measuring photocatalytic efficiency, degradation of methylene blue in combination with in situ UV-vis measurement was used. UV LEDs with 365 nm wavelength were taken to irradiate the TiO₂ layer. The influence of various sputter parameters was examined as well as post annealing time and temperature. To indicate correlation to effective surface area, roughness and crystallinity, AFM and XRD measurements were done.