Berlin 2012 – scientific programme

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DS: Fachverband Dünne Schichten

DS 37: Poster II: Focused electron beam induced processing for the fabrication of nanostructures (focused session, jointly with O); Nanoengineered thin films; Layer properties: electrical, optical, and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM, XPS, SIMS, RBS,..); Application of thin films

DS 37.8: Poster

Thursday, March 29, 2012, 15:00–17:00, Poster E

Analysis of process parameters for a DCMS process of a rotating ceramic ITO target — •Patrick Ries and Matthias Wuttig — Institute of Physics (IA), RWTH Aachen University

ITO is the most commonly used but at the same time rather expensive Transparent Conducting Oxide. This fact is due to the high Indium to Tin ratio of 90:10 that is necessary to obtain the best electrical conductivity. If it is possible to find another ratio with similar electrical properties but higher Tin content, this would be of great industrial relevance. To accomplish this goal and to check the hypothesis an in-house developed serial co-sputtering system is employed. The tool consists of a rotating primary cathode and up to two secondary cathodes for co-sputtering processes. The process parameters of a DC-sputtered ceramic ITO target installed on the primary cathode are analyzed and correlations with the thin film properties, especially the resistance and the transmittance are shown. The resistance behavior upon changing the Tin content via a co-deposition process from a secondary cathode will be presented.