Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 38: Poster III: Resistive switching (jointly with DF, KR, HL); Thermoelectric materials (Focused session); Micro- and nanopatterning (jointly with O); Ion irradiation effects

DS 38.36: Poster

Donnerstag, 29. März 2012, 17:30–19:00, Poster E

Phase Change of Tetrahedral Amorphous-Carbon by Low Energy Electrons in a Scanning Tunnelling Microscope — •Frederik Klein and Thomas Mühl — Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden

Low energy electron-based energy deposition in tetrahedral amorphous-carbon thin films by a scanning tunnelling microscope leads to a local phase change of the carbon. Both the mass density and the electrical resistivity are reduced indicating a graphitization. We expose nano-sized surface areas to field emitted low energy electrons under high vacuum conditions and investigate the temperature and electron energy dependence of the carbon phase change process. Supplementary topography measurements are performed by atomic force microscopy.