Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 38: Poster III: Resistive switching (jointly with DF, KR, HL); Thermoelectric materials (Focused session); Micro- and nanopatterning (jointly with O); Ion irradiation effects

DS 38.41: Poster

Donnerstag, 29. März 2012, 17:30–19:00, Poster E

Towards nanofocusing of attosecond XUV pulses — •Christian Späth¹, Alexander Guggenmos², Soo Hoon Chew¹, Kellie Pearce¹, Michael Hofstetter², Jürgen Schmidt¹, and Ulf Kleineberg¹ — ¹Ludwig-Maximilians-Universität München, Fakultät Physik, 85748 Garching — ²Max-Planck-Institut für Quantenoptik, 85748 Garching

Attosecond pulses are finding more and more applications in measuring electron dynamics in atoms and molecules as well as electronic phenomena at surfaces and nanostructures. Nanofocusing of such pulses, for intensity enhancing at the sample position or for microscopic investigations, has not been successfully performed yet. We report on first towards diffractive polychromatic nanofocusing optics for XUV pulses at 90 eV photon energy.

Circular and elliptical zone plate structures have been written by advanced e-beam lithography in different resists (PMMA and HSQ) on ultrathin Si3N4 membrane windows.

Combining diffractive with refractive lenses on the same element results in increased usable bandwidth as required for focusing of sub femtosecond pulses. We will discuss the capabilities and limitations of these new optics and report first steps towards their experimental fabrication.