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DS: Fachverband Dünne Schichten

DS 44: Poster IV: Thin film photovoltaics; Organic electronics and photovoltaics (jointly with CPP, HL, O); Organic thin films; Trends in atomic layer deposition (Focused session)

DS 44.1: Poster

Freitag, 30. März 2012, 09:30–12:00, Poster E

Study of the optical properties of TiO2 Thin Films prepared by rapid thermal oxidation — Wafaa Al-Khayat^{1, 2} and •Gerhard Wilde¹ — ¹Institute of Materials Physics, WWU Münster, Wilhelm-Klemm-Str. 10, 48149 Münster, Germany — ²Collage of Science, Al-Mustansiriy University, Baghdad, Iraq

TiO2 thin films were deposited by the thermal oxidation method on glass substrates at room temperature. The X-ray diffraction patterns indicate an amorphous structure of the TiO2 thin films. The optical constants were characterized using the transmission spectra of the films obtained by uv-vis spectrophotometer. The optical band gaps were evaluated by the Tauce model. The optical properties of the thin films are discussed with respect of the film thickness and the oxidation condition.